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SPIE Advanced Lithography + Patterning 2026 Exhibitors List and Attendees List
- 22 - 26 Feb 2026
- 5k - 10k Visitors
- San Jose, United States
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SPIE Advanced Lithography + Patterning 2026 is a leading global conference and exhibition focused on the science and technology of lithography, patterning, and next-generation micro/nanofabrication methods critical to semiconductor manufacturing, photonics, optoelectronics, and advanced devices. The event brings together researchers, engineers, equipment and materials suppliers, and industry leaders to share pioneering work, technology innovations, process improvements, and collaborative strategies that shape the future of high-performance electronics.
This high-impact technical event attracts semiconductor process engineers, lithography researchers, R&D scientists, equipment and materials vendors, fab and foundry technologists, design-for-manufacturability specialists, advanced packaging experts, and procurement teams seeking emerging solutions in patterning, EUV/DUV lithography, nanoimprint, and process optimization.
Whether your organization specializes in photolithography tools, advanced patterning materials, masks and reticles, metrology and inspection, process control software, or integration services, the SPIE Advanced Lithography + Patterning 2026 exhibitors and attendees database helps you connect with verified decision-makers and buyers actively engaged in cutting-edge micro/nano-fabrication and device production.















